Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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III-V nitrides for electronic and optoelectronic applicationsDavis, R.F.Proceedings of the IEEE, 1991-05, Vol.79 (5), p.702-712 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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2 |
Material Type: Artigo
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Valence-band discontinuity between GaN and AlN measured by x-ray photoemission spectroscopyMartin, G. ; Strite, S. ; Botchkarev, A. ; Agarwal, A. ; Rockett, A. ; Morkoç, H. ; Lambrecht, W. R. L. ; Segall, B.Applied physics letters, 1994-08, Vol.65 (5), p.610-612 [Periódico revisado por pares]United StatesTexto completo disponível |
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3 |
Material Type: Artigo
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Heteroepitaxial wurtzite and zinc-blende structure GaN grown by reactive-ion molecular-beam epitaxy : growth kinetics, microstructure, and propertiesPOWELL, R. C ; LEE, N.-E ; KIM, Y.-W ; GREENE, J. EJournal of applied physics, 1993, Vol.73 (1), p.189-204 [Periódico revisado por pares]Woodbury, NY: American Institute of PhysicsTexto completo disponível |
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4 |
Material Type: Artigo
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Predicted elastic constants and critical layer thicknesses for cubic phase AlN, GaN, and InN on β-SiCSherwin, M. E. ; Drummond, T. J.Journal of applied physics, 1991-06, Vol.69 (12), p.8423-8425 [Periódico revisado por pares]United StatesTexto completo disponível |
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5 |
Material Type: Artigo
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GaN grown on hydrogen plasma cleaned 6H-SiC substratesLIN, M. E ; STRITE, S ; AGARWAL, A ; SALVADOR, A ; ZHOU, G. L ; TERAGUCHI, N ; ROCKETT, A ; MORKOC, HApplied physics letters, 1993-02, Vol.62 (7), p.702-704 [Periódico revisado por pares]Melville, NY: American Institute of PhysicsTexto completo disponível |
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6 |
Material Type: Artigo
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Thermodynamic and kinetic processes involved in the growth of epitaxial GaN thin filmsNEWMAN, N ; ROSS, J ; RUBIN, MApplied physics letters, 1993-03, Vol.62 (11), p.1242-1244 [Periódico revisado por pares]Melville, NY: American Institute of PhysicsTexto completo disponível |
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7 |
Material Type: Artigo
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Reactive ion etching of gallium nitride using hydrogen bromide plasmasAdesida, I. ; Kuznia, J.N. ; Ping, A.T. ; Asif Khan, M.Electronics letters, 1994-10, Vol.30 (22), p.1895-1897 [Periódico revisado por pares]Sem texto completo |
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8 |
Material Type: Ata de Congresso
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Deep submicron AlGaN/GaN heterostructure field effect transistors for nficrowave and high temperature applicationsKhan, M.A. ; Kuznia, J.N. ; Olson, D.T. ; Schaff, W.J. ; Burm, J.W. ; Shur, M.S.52nd Annual Device Research Conference, 1994, p.149-150IEEESem texto completo |
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9 |
Material Type: Artigo
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Single crystal wurtzite GaN on (111) GaAs with AlN buffer layers grown by reactive magnetron sputter depositionRoss, Jennifer ; Rubin, Mike ; Gustafson, T.K.Journal of materials research, 1993-10, Vol.8 (10), p.2613-2616 [Periódico revisado por pares]New York, USA: Cambridge University PressTexto completo disponível |
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10 |
Material Type: Artigo
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Local vibrational modes in Mg-doped gallium nitrideBrandt, MS ; Ager, 3rd, JW ; Götz, W ; Johnson, NM ; Harris, Jr, JS ; Molnar, RJ ; Moustakas, TDPhysical review. B, Condensed matter, 1994-05, Vol.49 (20), p.14758-14761 [Periódico revisado por pares]United StatesTexto completo disponível |