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Refinado por: Nome da Publicação: Applied Surface Science remover
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Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers
Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers
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Characteristics of high aspect ratio SiO2 etching using C4H2F6 isomers

Lee, Hye Joo ; Tak, Hyun Woo ; Kim, Seong Bae ; Kim, Seul Ki ; Park, Tae Hyun ; Kim, Ji Yeun ; Sung, Dain ; Lee, Wonseok ; Lee, Seung Bae ; Kim, Keunsuk ; Cho, Byeong Ok ; Kim, Young Lea ; Lee, Ki Chan ; Kim, Dong Woo ; Yeom, Geun Young

Applied surface science, 2023-12, Vol.639, p.158190, Article 158190 [Periódico revisado por pares]

Elsevier B.V

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2
Carbon vacancy-induced enhancement of the visible light-driven photocatalytic oxidation of NO over g-C 3 N 4 nanosheets
Carbon vacancy-induced enhancement of the visible light-driven photocatalytic oxidation of NO over g-C 3 N 4 nanosheets
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Carbon vacancy-induced enhancement of the visible light-driven photocatalytic oxidation of NO over g-C 3 N 4 nanosheets

Li, Yuhan ; Ho, Wingkei ; Lv, Kangle ; Zhu, Bicheng ; Lee, Shun Cheng

Applied surface science, 2018-02, Vol.430, p.380-389 [Periódico revisado por pares]

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3
Plasma atomic layer etching of molybdenum with surface fluorination
Plasma atomic layer etching of molybdenum with surface fluorination
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Plasma atomic layer etching of molybdenum with surface fluorination

Kim, Yongjae ; Kang, Hojin ; Ha, Heeju ; Kim, Changkoo ; Cho, Sungmin ; Chae, Heeyeop

Applied surface science, 2023-08, Vol.627, p.157309, Article 157309 [Periódico revisado por pares]

Elsevier B.V

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4
Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres
Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres
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Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres

Ma, Ho Jin ; Park, Young-Jo ; Kim, Mi-Ju ; Kim, Ha-Neul ; Ko, Jae-Woong ; Lee, Jae-Wook ; Kim, Jung-Hyung ; Lee, Hyo-Chang

Applied surface science, 2023-12, Vol.641, p.158483, Article 158483 [Periódico revisado por pares]

Elsevier B.V

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5
Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6
Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6
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Bias-supply timing tailored to the aspect ratio dependence of silicon trench etching in Ar plasma with alternately injected C4F8 and SF6

Yoshie, Taito ; Ishikawa, Kenji ; Nguyen, Thi-Thuy-Nga ; Hsiao, Shih-Nan ; Tsutsumi, Takayoshi ; Sekine, Makoto ; Hori, Masaru

Applied surface science, 2023-11, Vol.638, p.157981, Article 157981 [Periódico revisado por pares]

Elsevier B.V

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6
Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar
Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar
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Selective etching of SiN against SiO2 and poly-Si films in hydrofluoroethane chemistry with a mixture of CH2FCHF2, O2, and Ar

Hsiao, Shih-Nan ; Ishikawa, Kenji ; Hayashi, Toshio ; Ni, Jiwei ; Tsutsumi, Takayoshi ; Sekine, Makoto ; Hori, Masaru

Applied surface science, 2021-03, Vol.541, p.148439, Article 148439 [Periódico revisado por pares]

Elsevier B.V

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7
Effects of H2 pre-etching on BN seed morphology and induced graphene synthesis on Cu substrate: A theoretical study
Effects of H2 pre-etching on BN seed morphology and induced graphene synthesis on Cu substrate: A theoretical study
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Effects of H2 pre-etching on BN seed morphology and induced graphene synthesis on Cu substrate: A theoretical study

Sun, Xiucai ; Luo, Xingyun ; Li, Yanlu ; Yu, Fapeng ; Zhao, Xian ; Yang, Lei

Applied surface science, 2021-01, Vol.537, p.148093, Article 148093 [Periódico revisado por pares]

Elsevier B.V

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8
A controllable top-down etching and in-situ oxidizing strategy: metal-organic frameworks derived α-Co/Ni(OH)2@Co3O4 hollow nanocages for enhanced supercapacitor performance
A controllable top-down etching and in-situ oxidizing strategy: metal-organic frameworks derived α-Co/Ni(OH)2@Co3O4 hollow nanocages for enhanced supercapacitor performance
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A controllable top-down etching and in-situ oxidizing strategy: metal-organic frameworks derived α-Co/Ni(OH)2@Co3O4 hollow nanocages for enhanced supercapacitor performance

Bao, Yuxiang ; Deng, Ying ; Wang, Moze ; Xiao, Zhenyu ; Wang, Minghui ; Fu, Yunlei ; Guo, Ziyang ; Yang, Yu ; Wang, Lei

Applied surface science, 2020-02, Vol.504, p.144395, Article 144395 [Periódico revisado por pares]

Elsevier B.V

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9
Wafer-scale vertical GaN nanorod arrays with nonpolar facets using TMAH wet etching
Wafer-scale vertical GaN nanorod arrays with nonpolar facets using TMAH wet etching
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Wafer-scale vertical GaN nanorod arrays with nonpolar facets using TMAH wet etching

Ryu, Hyesu ; Choi, Hak-Jong ; Kulkarni, Mandar ; Rho, Hokyun ; Lim, Hyungjun ; Ryu, Sang-Wan ; Ha, Jun-Seok ; Lee, Sang Hyun

Applied surface science, 2024-07, Vol.661, Article 160040 [Periódico revisado por pares]

Elsevier B.V

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10
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide
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Effect of hydrofluorocarbon structure of C3H2F6 isomers on high aspect ratio etching of silicon oxide

Tak, Hyun Woo ; Lee, Hye Joo ; Wen, Long ; Kang, Byung Jin ; Sung, Dain ; Bae, Jeong Woon ; Kim, Dong Woo ; Lee, Wonseok ; Lee, Seung Bae ; Kim, Keunsuk ; Cho, Byeong Ok ; Kim, Young Lea ; Song, Han Dock ; Yeom, Geun Young

Applied surface science, 2022-10, Vol.600, p.154050, Article 154050 [Periódico revisado por pares]

Elsevier B.V

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