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1 |
Material Type: Artigo
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Growth and Selective Etch of Phosphorus-Doped Silicon/Silicon–Germanium Multilayers Structures for Vertical Transistors ApplicationLi, Chen ; Lin, Hongxiao ; Li, Junjie ; Yin, Xiaogen ; Zhang, Yongkui ; Kong, Zhenzhen ; Wang, Guilei ; Zhu, Huilong ; Radamson, Henry H.Nanoscale research letters, 2020-12, Vol.15 (1), p.225-225, Article 225 [Periódico revisado por pares]New York: Springer USTexto completo disponível |
2 |
Material Type: Artigo
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Chemical vapor deposition of layered two-dimensional MoSi2N4 materialsHong, Yi-Lun ; Liu, Zhibo ; Wang, Lei ; Zhou, Tianya ; Ma, Wei ; Xu, Chuan ; Feng, Shun ; Chen, Long ; Chen, Mao-Lin ; Sun, Dong-Ming ; Chen, Xing-Qiu ; Cheng, Hui-Ming ; Ren, WencaiScience (American Association for the Advancement of Science), 2020-08, Vol.369 (6504), p.670-674 [Periódico revisado por pares]Washington: The American Association for the Advancement of ScienceTexto completo disponível |
3 |
Material Type: Artigo
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Selective etching of silicon nitride over silicon oxide using ClF3/H2 remote plasmaLee, Won Oh ; Kim, Ki Hyun ; Kim, Doo San ; Ji, You Jin ; Kang, Ji Eun ; Tak, Hyun Woo ; Park, Jin Woo ; Song, Han Dock ; Kim, Ki Seok ; Cho, Byeong Ok ; Kim, Young Lae ; Yeom, Geun YoungScientific reports, 2022-04, Vol.12 (1), p.5703-5703, Article 5703 [Periódico revisado por pares]London: Nature Publishing GroupTexto completo disponível |
4 |
Material Type: Artigo
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Top-Down Nanofabrication and Characterization of 20 nm Silicon Nanowires for Biosensing ApplicationsM Nuzaihan, M N ; Hashim, U ; Md Arshad, M K ; Rahim Ruslinda, A ; Rahman, S F A ; Fathil, M F M ; Ismail, Mohd H Mishra, Yogendra KumarPloS one, 2016-03, Vol.11 (3), p.e0152318-e0152318 [Periódico revisado por pares]United States: Public Library of ScienceTexto completo disponível |
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Material Type: Artigo
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Fabrication of Black Silicon via Metal-Assisted Chemical Etching—A ReviewArafat, Mohammad Yasir ; Islam, Mohammad Aminul ; Mahmood, Ahmad Wafi Bin ; Abdullah, Fairuz ; Nur-E-Alam, Mohammad ; Kiong, Tiong Sieh ; Amin, NowshadSustainability, 2021-10, Vol.13 (19), p.10766 [Periódico revisado por pares]Basel: MDPI AGTexto completo disponível |
6 |
Material Type: Artigo
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Single-mask fabrication of micro-probe electrode array with various tip heights and sharpness using isotropic and anisotropic etchingShin, Young-min ; Kim, Yong-Kweon ; Lee, Seung-Ki ; Park, Jae-HyoungMicro & nano letters, 2018-09, Vol.13 (9), p.1245-1247 [Periódico revisado por pares]Stevenage: The Institution of Engineering and TechnologyTexto completo disponível |
7 |
Material Type: Artigo
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Wafer-scale synthesis of a morphologically controllable silicon ordered array as a platform and its SERS performanceSong, Jizhe ; Feng, Sujuan ; Shi, Haonan ; Han, Daotong ; Liu, GuangqiangRSC advances, 2023-11, Vol.13 (48), p.33625-33633 [Periódico revisado por pares]Cambridge: Royal Society of ChemistryTexto completo disponível |
8 |
Material Type: Artigo
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Cone Angle Modulation of Silicon Nanocones through Double Etching Processes in Metal-Assisted Chemical EtchingChen, Hui ; Bian, Chenyu ; Zhang, Cheng ; Wang, Shaojun ; Zhang, BingchangJournal of physics. Conference series, 2023-03, Vol.2463 (1), p.12004 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |
9 |
Material Type: Artigo
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Large area fabrication of high aspect ratio nano-cylinders on micro-pillars based on a colloidal crystal maskYan, Zexiang ; Wang, Ying ; Zeng, Xingchang ; Lu, Jiangbo ; Lv, Xianglian ; Yuan, Weizheng ; He, YangMicro & nano letters, 2020-12, Vol.15 (15), p.1115-1119 [Periódico revisado por pares]Stevenage: The Institution of Engineering and TechnologyTexto completo disponível |
10 |
Material Type: Artigo
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Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructuresAkan, Rabia ; Parfeniukas, Karolis ; Vogt, Carmen ; Toprak, Muhammet S ; Vogt, UlrichRSC advances, 2018-01, Vol.8 (23), p.12628-12634 [Periódico revisado por pares]England: Royal Society of ChemistryTexto completo disponível |