Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Ultralow-Voltage Bilayer Graphene Tunnel FETFiori, G. ; Iannaccone, G.IEEE electron device letters, 2009-10, Vol.30 (10), p.1096-1098 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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2 |
Material Type: Artigo
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875-MW/cm² Low-Resistance NO₂ p-Type Doped Chemical Mechanical Planarized Diamond MOSFETsSaha, Niloy Chandra ; Kim, Seong-Woo ; Oishi, Toshiyuki ; Kasu, MakotoIEEE electron device letters, 2022-05, Vol.43 (5), p.777-780 [Periódico revisado por pares]New York: IEEETexto completo disponível |
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3 |
Material Type: Artigo
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Graphene-Based Ambipolar RF MixersHan Wang ; Hsu, Allen ; Wu, Justin ; Jing Kong ; Palacios, TomasIEEE electron device letters, 2010-09, Vol.31 (9), p.906-908 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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4 |
Material Type: Artigo
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Inverters With Strained Si Nanowire Complementary Tunnel Field-Effect TransistorsKnoll, Lars ; Zhao, Qing-Tai ; Nichau, Alexander ; Trellenkamp, Stefan ; Richter, Simon ; Schafer, Anna ; Esseni, David ; Selmi, Luca ; Bourdelle, Konstantin K. ; Mantl, SiegfriedIEEE electron device letters, 2013-06, Vol.34 (6), p.813-815 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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5 |
Material Type: Artigo
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Sensitivity of Threshold Voltage to Nanowire Width Variation in Junctionless TransistorsSung-Jin Choi ; Dong-Il Moon ; Sungho Kim ; Duarte, J P ; Yang-Kyu ChoiIEEE electron device letters, 2011-02, Vol.32 (2), p.125-127 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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6 |
Material Type: Artigo
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MoS2 Nanoribbon Transistors: Transition From Depletion Mode to Enhancement Mode by Channel-Width TrimmingHAN LIU ; JIANGJIANG GU ; YE, Peide DIEEE electron device letters, 2012-09, Vol.33 (9), p.1273-1275 [Periódico revisado por pares]New York, NY: Institute of Electrical and Electronics EngineersTexto completo disponível |
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7 |
Material Type: Artigo
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Logic Circuits With Hydrogenated Diamond Field-Effect TransistorsJiangwei Liu ; Ohsato, Hirotaka ; Meiyong Liao ; Imura, Masataka ; Watanabe, Eiichiro ; Koide, YasuoIEEE electron device letters, 2017-07, Vol.38 (7), p.922-925 [Periódico revisado por pares]IEEETexto completo disponível |
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8 |
Material Type: Artigo
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Improving Deposition Density of Solution Processed Carbon Nanotubes by Substrate Treatment for High-Performance Flexible Thin Film TransistorsXiang, Li ; Ye, Huaidong ; Yu, Xingge ; Liu, Jie ; Pan, AnlianIEEE electron device letters, 2024-04, p.1-1 [Periódico revisado por pares]IEEETexto completo disponível |
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9 |
Material Type: Artigo
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High-performance fully depleted silicon nanowire (diameter /spl les/ 5 nm) gate-all-around CMOS devicesSingh, N. ; Agarwal, A. ; Bera, L.K. ; Liow, T.Y. ; Yang, R. ; Rustagi, S.C. ; Tung, C.H. ; Kumar, R. ; Lo, G.Q. ; Balasubramanian, N. ; Kwong, D.-L.IEEE electron device letters, 2006-05, Vol.27 (5), p.383-386 [Periódico revisado por pares]New York, NY: IEEETexto completo disponível |
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10 |
Material Type: Artigo
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Anode-Integrated GaN Field Emitter Arrays for Compact Vacuum TransistorsShih, Pao-Chuan ; Perozek, Joshua ; Akinwande, Akintunde I. ; Palacios, TomasIEEE electron device letters, 2023-11, Vol.44 (11), p.1895-1898 [Periódico revisado por pares]IEEETexto completo disponível |