Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Ata de Congresso
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Issues in nuclear waste isolation researchDELAGE, Pierre ; YU JUN CUIEngineering geology, 2005, Vol.81 (3) [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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2 |
Material Type: Ata de Congresso
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Comparative study of argon and hydrogen/helium plasma treatments on the properties of Cu/SiLK damascene structures for interconnect technologyLI, C. Y ; ZHANG, D. H ; SU, S. S ; LU, P. W ; HE, X ; JIA, G. J ; CHEN, Zhe ; WU, S. Y ; KUMAR, RakeshThin solid films, 2004, Vol.462-63, p.172-175 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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3 |
Material Type: Ata de Congresso
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Development and reliability of non-conductive adhesive flip-chip packagesTEH, L. K ; ANTO, E ; WONG, C. C ; MHAISALKAR, S. G ; WONG, E. H ; TEO, P. S ; CHEN, ZThin solid films, 2004, Vol.462-63, p.446-453 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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4 |
Material Type: Ata de Congresso
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Effect of post-reflow cooling rate on intermetallic compound formation between Sn-3.5 Ag solder and Ni-P under bump metallizationHE, Min ; CHEN, Zhong ; QI, Guojun ; WONG, C. C ; MHAISALKAR, S. GThin solid films, 2004, Vol.462-63, p.363-369 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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5 |
Material Type: Ata de Congresso
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Impact of barrier metal on electrical performance of Cu/low K (Black Diamond) in 0.13-μm dual damascene interconnectionLI, H. Y ; LI, C. Y ; SU, Y. J ; TSANG, C. FThin solid films, 2004, Vol.462-63, p.245-249 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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6 |
Material Type: Ata de Congresso
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Copper surface protection with a completely enclosed copper structure for a damascene processWANG, T. C ; HSIEH, T. E ; WANG, Y. L ; WU, Y. L ; LO, K. Y ; LIU, C. W ; CHEN, K. WThin solid films, 2004, Vol.447-48, p.542-548 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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7 |
Material Type: Ata de Congresso
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Alpha radiation sources in low alpha materials and implications for low alpha materials refinementCLARK, Brett M ; WEISER, Martin W ; RASIAH, Ignatius JThin solid films, 2004, Vol.462-63, p.384-386 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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8 |
Material Type: Ata de Congresso
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CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applicationsCHANG, T. C ; TSAI, T. M ; LIU, P. T ; CHEN, C. W ; YAN, S. T ; AOKI, H ; CHANGE, Y. C ; TSENG, T. YThin solid films, 2004, Vol.447-48, p.524-530 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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9 |
Material Type: Ata de Congresso
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Evaluation of advanced chemical mechanical planarization techniques for copper damascene interconnectCHEN, K. W ; WANG, Y. L ; LIU, C. P ; YANG, Kevin ; CHANG, L ; LO, K. Y ; LIU, C. WThin solid films, 2004, Vol.447-48, p.531-536 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |
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10 |
Material Type: Ata de Congresso
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Effect of surface treatment on dielectric leakage and breakdown of copper damascene interconnectsNGWAN, V. C ; CHUNXIANG ZHU ; KRISHNAMOORTHY, AhilaThin solid films, 2004, Vol.462-63, p.321-324 [Periódico revisado por pares]Lausanne: Elsevier ScienceTexto completo disponível |