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1
Dry Etch Challenges in Gate All Around Devices for sub 32 nm Applications
Material Type:
Ata de Congresso
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Dry Etch Challenges in Gate All Around Devices for sub 32 nm Applications

Barnola, Sebastien ; Vizioz, Christian ; Vulliet, Nathalie ; Dupré, Cécilia ; Ernst, Thomas ; Gautier, Pauline ; Arvet, Christian ; Guillaumot, Bernard ; Bernard, Emilie ; Pauliac-Vaujeour, S. ; Comboroure, Corine ; Hartmann, Jean-Michel ; Borel, Stephan ; Chevolleau, Thierry ; Maffini-Alvaro, V ; Becu, S

ECS transactions, 2009, Vol.16 (10), p.923-934

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2
3D Suspended Nanowires Integration for CMOS and Beyond
Material Type:
Ata de Congresso
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3D Suspended Nanowires Integration for CMOS and Beyond

Ernst, Thomas ; Tachi, Kiichi ; Hubert, Alexandre ; Saracco, Emeline ; Dupré, Cécilia ; Bécu, Stéphane ; Vulliet, Nathalie ; Bernard, Emilie ; Cherns, Peter ; Maffini-Alvaro, Virginie ; Damlencourt, Jean-François ; Vizioz, Christian ; Colonna, Jean-Philippe ; Bonafos, Caroline ; Hartmann, Jean-Michel

ECS transactions, 2009, Vol.25 (7), p.471-478

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