Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Ata de Congresso
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Automated optical proximity correction: a rules-based approachOtto, Oberdan W ; Garofalo, Joseph G ; Low, K. K ; Yuan, Chi-Min ; Henderson, Richard C ; Pierrat, Christophe ; Kostelak, Robert L ; Vaidya, Sheila ; Vasudev, P. KSPIE 1994Texto completo disponível |
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2 |
Material Type: Ata de Congresso
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Applications of enhanced optical proximity correction modelsZhao, Jack Q ; Garofalo, Joseph G ; Blatchford, James W ; Ehrlacher, Edward ; Nease, EllisSPIE proceedings series, 1998, Vol.3334, p.234-244Bellingham WA: SPIETexto completo disponível |
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3 |
Material Type: Ata de Congresso
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RF monitoring of commercial vascular stents with dipole scattering resonancesArauz Garofalo, Gianluca ; López Domínguez, Víctor ; Hernández Ferras, Joan Manel ; Rodríguez Leor, Oriol ; Bayés Genis, Antoni ; Rius Casals, Juan Manuel ; O'Callaghan Castellà, Juan Manuel ; García Santiago, Antoni ; Tejada Palacios, JavierInstitute of Electrical and Electronics Engineers (IEEE) 2014Texto completo disponível |
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4 |
Material Type: Ata de Congresso
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Walking control of fully actuated robots based on the Bipedal SLIP modelGarofalo, G. ; Ott, C. ; Albu-Schaffer, A.2012 IEEE International Conference on Robotics and Automation, 2012, p.1456-1463IEEETexto completo disponível |
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5 |
Material Type: Ata de Congresso
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Reduction of ASIC gate-level line-end shortening by mask compensationGarofalo, Joseph G ; DeMarco, John ; Bailey, J ; Xiao, Jiabei ; Vaidya, SheilaSPIE 1995Texto completo disponível |
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6 |
Material Type: Ata de Congresso
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Linesize effects on UV reflectance spectraZiger, David H ; Adams, Thomas E ; Garofalo, Joseph GSPIE 1996Texto completo disponível |
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7 |
Material Type: Ata de Congresso
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Control and uniformity of 280-nm features in i-line lithography using optical proximity corrections and off-axis illuminationWatson, Pat G ; Garofalo, Joseph G ; Hansen, M ; Grodnensky, Ilya M ; Zych, Ludwik J ; Takahashi, R ; Yarbrough, Willie J ; Ehrlacher, Edward ; Reim, A ; Vella, R. M ; Dunbar, A ; Colina, Albert ; Herrero, B ; Castro, DSPIE 1997Texto completo disponível |
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8 |
Material Type: Ata de Congresso
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Simplified rule generation for automated rules-based optical enhancementOtto, Oberdan W ; Garofalo, Joseph G ; Henderson, Richard CSPIE 1995Texto completo disponível |
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9 |
Material Type: Ata de Congresso
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Focused-ion-beam repair of phase-shift photomasksHarriott, Lloyd R ; Garofalo, Joseph G ; Kostelak, Robert LSPIE 1992Texto completo disponível |
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10 |
Material Type: Ata de Congresso
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Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithographyGarofalo, Joseph G ; Otto, Oberdan W ; Cirelli, Raymond A ; Kostelak, Robert L ; Vaidya, SheilaSPIE 1995Texto completo disponível |