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1
Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC
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Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlC

FRODELIUS, J ; EKLUND, P ; BECKERS, M ; PERSSON, P. O. A ; HÖGBERG, H ; HULTMAN, L

Thin solid films, 2010, Vol.518 (6), p.1621-1626 [Peer Reviewed Journal]

Amsterdam: Elsevier

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2
Homoepitaxial growth of Ti-Si-C MAX-phase thin films on bulk Ti3SiC2 substrates
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Homoepitaxial growth of Ti-Si-C MAX-phase thin films on bulk Ti3SiC2 substrates

EKLUND, P ; MURUGAIAH, A ; EMMERLICH, J ; CZIGANY, Zs ; FRODELIUS, J ; BARSOUM, M. W ; HÖGBERG, H ; HULTMAN, L

Journal of crystal growth, 2007-06, Vol.304 (1), p.264-269 [Peer Reviewed Journal]

Amsterdam: Elsevier

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3
Direct current magnetron sputtering deposition of nanocomposite alumina — zirconia thin films
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Direct current magnetron sputtering deposition of nanocomposite alumina — zirconia thin films

Trinh, D.H. ; Kubart, T. ; Nyberg, T. ; Ottosson, M. ; Hultman, L. ; Högberg, H.

Thin solid films, 2008-10, Vol.516 (23), p.8352-8358 [Peer Reviewed Journal]

Amsterdam: Elsevier B.V

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4
Microstructure and electrical properties of Ti–Si–C–Ag nanocomposite thin films
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Microstructure and electrical properties of Ti–Si–C–Ag nanocomposite thin films

Eklund, P. ; Joelsson, T. ; Ljungcrantz, H. ; Wilhelmsson, O. ; Czigány, Zs ; Högberg, H. ; Hultman, L.

Surface & coatings technology, 2007, Vol.201 (14), p.6465-6469 [Peer Reviewed Journal]

Lausanne: Elsevier B.V

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5
Formation of basal plane fiber-textured Ti2AlN films on amorphous substrates
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Formation of basal plane fiber-textured Ti2AlN films on amorphous substrates

Beckers, M. ; Eriksson, F. ; Lauridsen, J. ; Baehtz, C. ; Jensen, J. ; Hultman, L.

Physica status solidi. PSS-RRL. Rapid research letters, 2010-06, Vol.4 (5-6), p.121-123 [Peer Reviewed Journal]

Berlin: WILEY-VCH Verlag

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6
Ti2AlC coatings deposited by High Velocity Oxy-Fuel spraying
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Ti2AlC coatings deposited by High Velocity Oxy-Fuel spraying

FRODELIUS, Jenny ; SONESTEDT, Marie ; BJÖRKLUND, Stefan ; PALMQUIST, Jens-Petter ; STILLER, Krystyna ; HÖGBERG, Hans ; HULTMAN, Lars

Surface & coatings technology, 2008-08, Vol.202 (24), p.5976-5981 [Peer Reviewed Journal]

Amsterdam: Elsevier

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7
Internal stress and microstructure of SiC reinforced aluminium alloy 2014
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Internal stress and microstructure of SiC reinforced aluminium alloy 2014

Weiland, A. ; Hultman, L. ; Wahlström, U. ; Persson, C. ; Johannesson, T.

Acta Materialia, 1998-09, Vol.46 (15), p.5271-5281 [Peer Reviewed Journal]

Oxford: Elsevier Ltd

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8
Epitaxial growth of ZrN on Si(100)
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Epitaxial growth of ZrN on Si(100)

BARNETT, S. A ; HULTMAN, L ; SUNDGREN, J.-E ; RONIN, F ; ROHDE, S

Appl. Phys. Lett.; (United States), 1988-08, Vol.53 (5), p.400-402 [Peer Reviewed Journal]

Melville, NY: American Institute of Physics

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9
Carbide and nanocomposite thin films in the Ti–Pt–C system
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Article
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Carbide and nanocomposite thin films in the Ti–Pt–C system

Lewin, Erik ; Buchholt, Kristina ; Lu, Jun ; Hultman, Lars ; Spetz, Anita Lloyd ; Jansson, Ulf

Thin solid films, 2010-07, Vol.518 (18), p.5104-5109 [Peer Reviewed Journal]

Amsterdam: Elsevier B.V

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