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Refinado por: assunto: Plasma remover idioma: Japonês remover autor: Sekine, Makoto remover
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1
Review of methods for the mitigation of plasma‐induced damage to low‐dielectric‐constant interlayer dielectrics used for semiconductor logic device interconnects
Review of methods for the mitigation of plasma‐induced damage to low‐dielectric‐constant interlayer dielectrics used for semiconductor logic device interconnects
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Review of methods for the mitigation of plasma‐induced damage to low‐dielectric‐constant interlayer dielectrics used for semiconductor logic device interconnects

Miyajima, Hideshi ; Ishikawa, Kenji ; Sekine, Makoto ; Hori, Masaru

Plasma processes and polymers, 2019-09, Vol.16 (9), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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2
Ar/SF6 plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation and secondary electron emission
Ar/SF6 plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation and secondary electron emission
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Ar/SF6 plasma simulation for dual-frequency capacitively coupled plasma incorporating gas flow simulation and secondary electron emission

Takagi, Shigeyuki ; Kawamura, Suguru ; Sekine, Makoto

Japanese Journal of Applied Physics, 2022-01, Vol.61 (SA) [Periódico revisado por pares]

Tokyo: IOP Publishing

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3
Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures
Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures
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Effects of hydrogen content in films on the etching of LPCVD and PECVD SiN films using CF4/H2 plasma at different substrate temperatures

Hsiao, Shih‐Nan ; Britun, Nikolay ; Nguyen, Thi‐Thuy‐Nga ; Tsutsumi, Takayoshi ; Ishikawa, Kenji ; Sekine, Makoto ; Hori, Masaru

Plasma processes and polymers, 2021-11, Vol.18 (11), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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4
Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature
Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature
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Photoluminescence recovery by in-situ exposure of plasma-damaged n-GaN to atomic hydrogen at room temperature

Chen, Shang ; Lu, Yi ; Kometani, Ryosuke ; Ishikawa, Kenji ; Kondo, Hiroki ; Tokuda, Yutaka ; Sekine, Makoto ; Hori, Masaru

AIP advances, 2012-06, Vol.2 (2), p.022149-022149-6 [Periódico revisado por pares]

United States: AIP Publishing LLC

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5
Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges
Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges
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Oriented Carbon Nanostructures by Plasma Processing: Recent Advances and Future Challenges

Santhosh, Neelakandan M ; Filipič, Gregor ; Tatarova, Elena ; Baranov, Oleg ; Kondo, Hiroki ; Sekine, Makoto ; Hori, Masaru ; Ostrikov, Kostya Ken ; Cvelbar, Uroš

Micromachines (Basel), 2018-11, Vol.9 (11), p.565 [Periódico revisado por pares]

Switzerland: MDPI AG

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6
Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition
Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition
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Control of sp2-C cluster incorporation of amorphous carbon films grown by H-radical-injection CH4/H2 plasma-enhanced chemical vapor deposition

Sugiura, Hirotsugu ; Jia, Lingyun ; Ohashi, Yasuyuki ; Kondo, Hiroki ; Ishikawa, Kenji ; Tsutsumi, Takayoshi ; Hayashi, Toshio ; Takeda, Keigo ; Sekine, Makoto ; Hori, Masaru

Japanese Journal of Applied Physics, 2019-02, Vol.58 (3), p.030912 [Periódico revisado por pares]

Tokyo: IOP Publishing

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7
Formation mechanism of sidewall striation in high-aspect-ratio hole etching
Formation mechanism of sidewall striation in high-aspect-ratio hole etching
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Formation mechanism of sidewall striation in high-aspect-ratio hole etching

Omura, Mitsuhiro ; Hashimoto, Junichi ; Adachi, Takahiro ; Kondo, Yusuke ; Ishikawa, Masao ; Abe, Junko ; Sakai, Itsuko ; Hayashi, Hisataka ; Sekine, Makoto ; Hori, Masaru

Japanese Journal of Applied Physics, 2019-06, Vol.58 (SE), p.SEEB02 [Periódico revisado por pares]

Tokyo: IOP Publishing

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8
Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas
Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas
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Polyethylene terephthalate (PET) surface modification by VUV and neutral active species in remote oxygen or hydrogen plasmas

Zhang, Yan ; Ishikawa, Kenji ; Mozetič, Miran ; Tsutsumi, Takayoshi ; Kondo, Hiroki ; Sekine, Makoto ; Hori, Masaru

Plasma processes and polymers, 2019-06, Vol.16 (6), p.n/a [Periódico revisado por pares]

Weinheim: Wiley Subscription Services, Inc

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9
Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy
Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy
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Intracellular-molecular changes in plasma-irradiated budding yeast cells studied using multiplex coherent anti-Stokes Raman scattering microscopy

Furuta, Ryo ; Kurake, Naoyuki ; Ishikawa, Kenji ; Takeda, Keigo ; Hashizume, Hiroshi ; Kondo, Hiroki ; Ohta, Takayuki ; Ito, Masafumi ; Sekine, Makoto ; Hori, Masaru

Physical chemistry chemical physics : PCCP, 2017-05, Vol.19 (21), p.13438-13442 [Periódico revisado por pares]

England

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10
Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition
Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition
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Electrochemical Reaction in Hydrogen Peroxide and Structural Change of Platinum Nanoparticle-Supported Carbon Nanowalls Grown Using Plasma-Enhanced Chemical Vapor Deposition

Tomatsu, Masakazu ; Hiramatsu, Mineo ; Kondo, Hiroki ; Ishikawa, Kenji ; Tsutsumi, Takayoshi ; Sekine, Makoto ; Hori, Masaru

C (Basel), 2019-01, Vol.5 (1), p.7 [Periódico revisado por pares]

Basel: MDPI AG

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