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Kinetics of deposition and electrical properties of silicon nitride films obtained by 185 nm photolysis of SiH4-NH3 mixtures
Kinetics of deposition and electrical properties of silicon nitride films obtained by 185 nm photolysis of SiH4-NH3 mixtures
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Kinetics of deposition and electrical properties of silicon nitride films obtained by 185 nm photolysis of SiH4-NH3 mixtures

Guizot, J -L ; Alnot, P ; Wyczisk, F ; Perrin, J ; Allain, B

Semiconductor science and technology, 1991-07, Vol.6 (7), p.582-589 [Revista revisada por pares]

Bristol: IOP Publishing

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