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Material Type: Artigo
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Kinetics of deposition and electrical properties of silicon nitride films obtained by 185 nm photolysis of SiH4-NH3 mixturesGuizot, J -L ; Alnot, P ; Wyczisk, F ; Perrin, J ; Allain, BSemiconductor science and technology, 1991-07, Vol.6 (7), p.582-589 [Periódico revisado por pares]Bristol: IOP PublishingTexto completo disponível |