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Off-axis magnetron sputtering of YBCO films: the influence of atomic oxygen
Off-axis magnetron sputtering of YBCO films: the influence of atomic oxygen
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Off-axis magnetron sputtering of YBCO films: the influence of atomic oxygen

Westerheim, A.C. ; Yu-Jahnes, L.S. ; Anderson, A.C.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1001-1005

New York, NY: IEEE

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2
The effect of low mobility sputter conditions on thin-film disk tribology
The effect of low mobility sputter conditions on thin-film disk tribology
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The effect of low mobility sputter conditions on thin-film disk tribology

Schulz, K.J. ; Viswanathan, K.V. ; Wall, A.C. ; Bowen, A.J.

IEEE transactions on magnetics, 1992-09, Vol.28 (5), p.2527-2529

NEW YORK: IEEE

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3
The effects of the sputtering conditions on bismuth doped gadolinium iron garnet films
The effects of the sputtering conditions on bismuth doped gadolinium iron garnet films
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The effects of the sputtering conditions on bismuth doped gadolinium iron garnet films

Eppler, W. ; Kryder, M.H.

IEEE (Institute of Electrical and Electronics Engineers) Transactions on Magnetics; (USA), 1989-09, Vol.25 (5), p.3743-3745

United States: IEEE

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4
Microstructural, transport, and RF properties of multilayer-deposited YBCO films
Microstructural, transport, and RF properties of multilayer-deposited YBCO films
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Microstructural, transport, and RF properties of multilayer-deposited YBCO films

Madhavrao, L. ; Track, E.K. ; Drake, R.E. ; Patt, R. ; Hohenwarter, G.K.G. ; Radparvar, M.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1402-1405

New York, NY: IEEE

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5
Effect of Tl-sources on growth of Tl-Ba-Ca-Cu-O films by diffusion process
Effect of Tl-sources on growth of Tl-Ba-Ca-Cu-O films by diffusion process
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Effect of Tl-sources on growth of Tl-Ba-Ca-Cu-O films by diffusion process

Lin, R.J. ; Kuo, D.H. ; Wu, P.T.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1564-1567

New York, NY: IEEE

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6
Highly oriented Bi-based thin films with zero resistance at 106 K
Highly oriented Bi-based thin films with zero resistance at 106 K
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Highly oriented Bi-based thin films with zero resistance at 106 K

Kula, W. ; Sobolewski, R. ; Gorecka, J. ; Lewandowski, S.J.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1581-1584

New York, NY: IEEE

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7
Properties of ion-beam deposited YBCO thin films
Properties of ion-beam deposited YBCO thin films
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Properties of ion-beam deposited YBCO thin films

Li, K. ; Johnson, J.E.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1463-1466

New York, NY: IEEE

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8
The effect of sputter-deposition conditions on the coercive force in amorphous rare-earth-transition-metal thin films
The effect of sputter-deposition conditions on the coercive force in amorphous rare-earth-transition-metal thin films
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The effect of sputter-deposition conditions on the coercive force in amorphous rare-earth-transition-metal thin films

Davies, C.E. ; Somekh, R.E. ; Evetts, J.E. ; Storey, P.A.

IEEE Trans. Magn.; (United States), 1988-11, Vol.24 (6), p.2790-2792

United States: IEEE

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9
Annealing kinetics of thin permalloy films
Annealing kinetics of thin permalloy films
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Annealing kinetics of thin permalloy films

Butherus, A. ; Nakahara, S.

IEEE Trans. Magn.; (United States), 1985-07, Vol.21 (4), p.1301-1305

New York, NY: IEEE

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10
Application of high rate magnetron sputtering to the fabrication of A-15 compounds
Application of high rate magnetron sputtering to the fabrication of A-15 compounds
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Application of high rate magnetron sputtering to the fabrication of A-15 compounds

Kampwirth, R. ; Hafstrom, J. ; Wu, C.

IEEE Trans. Magn.; (United States), 1977-01, Vol.13 (1), p.315-318

United States: IEEE

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