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Marching of the microlithography horses: electron, ion, and photon: past, present, and future
Marching of the microlithography horses: electron, ion, and photon: past, present, and future
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Marching of the microlithography horses: electron, ion, and photon: past, present, and future

Lin, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2007, Vol.6520, p.652002-652002-18

Bellingham, Wash: SPIE

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2
Fish’n’Steps: Encouraging Physical Activity with an Interactive Computer Game
Fish’n’Steps: Encouraging Physical Activity with an Interactive Computer Game
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Fish’n’Steps: Encouraging Physical Activity with an Interactive Computer Game

Lin, James J. ; Mamykina, Lena ; Lindtner, Silvia ; Delajoux, Gregory ; Strub, Henry B.

Lecture notes in computer science, 2006, p.261-278 [Periódico revisado por pares]

Berlin, Heidelberg: Springer Berlin Heidelberg

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3
Characteristics Performance of Production-Worthy Multiple-E-Beam Maskless Lithography
Characteristics Performance of Production-Worthy Multiple-E-Beam Maskless Lithography
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Characteristics Performance of Production-Worthy Multiple-E-Beam Maskless Lithography

LIN, S. J ; WANG, W. C ; CHEN, P. S ; LIU, C. Y ; LO, T. N ; CHEN, Jack J. H ; KRECINIC, Faruk ; LIN, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2010, Vol.7637

Bellingham, Wash: SPIE

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4
Influence of Massively Parallel E-Beam Direct Write Pixel Size on Electron Proximity Correction
Influence of Massively Parallel E-Beam Direct Write Pixel Size on Electron Proximity Correction
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Influence of Massively Parallel E-Beam Direct Write Pixel Size on Electron Proximity Correction

LIN, S. J ; CHEN, P. S ; SHIN, J. J ; WANG, W. C ; LIN, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2011, Vol.7970

Bellingham WA: SPIE

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5
Decades of Rivalry and Complementary of Photon and Electron Beams
Decades of Rivalry and Complementary of Photon and Electron Beams
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Decades of Rivalry and Complementary of Photon and Electron Beams

LIN, Bum J

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7520

Bellingham, Wash: SPIE

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6
Litho/mask strategies for 32-nm half-pitch and beyond: Using established and adventurous tools/technologies to improve cost and imaging performance
Litho/mask strategies for 32-nm half-pitch and beyond: Using established and adventurous tools/technologies to improve cost and imaging performance
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Litho/mask strategies for 32-nm half-pitch and beyond: Using established and adventurous tools/technologies to improve cost and imaging performance

LIN, Bum J

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7379

Bellingham, Wash: SPIE

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7
Imaging Performance of Production-Worthy Multiple-E-Beam Maskless Lithography
Imaging Performance of Production-Worthy Multiple-E-Beam Maskless Lithography
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Imaging Performance of Production-Worthy Multiple-E-Beam Maskless Lithography

LIN, S. J ; WANG, W. C ; WIELAND, Marco ; CHEN, Jack J. H ; KRECINIC, Faruk ; LIN, Bum J ; DE BOER, Guido ; SLOT, Erwin ; JAGER, Remco ; STEENBRINK, Stijn ; KAMPHERBEEK, Bert-Jan

Proceedings of SPIE, the International Society for Optical Engineering, 2009, Vol.7520

Bellingham, Wash: SPIE

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8
Effect of novel rinsing material and surfactant treatment on the resist pattern performance
Effect of novel rinsing material and surfactant treatment on the resist pattern performance
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Effect of novel rinsing material and surfactant treatment on the resist pattern performance

Huang, Victor ; Chiu, C. C ; Lin, C. A ; Chang, Ching Yu ; Gau, T. S ; Lin, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2007, Vol.6519, p.65193C-65193C-9

Bellingham, Wash: SPIE

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9
Double exposure for the contact layer of the 65-nm node
Double exposure for the contact layer of the 65-nm node
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Double exposure for the contact layer of the 65-nm node

Owe-Yang, Dah-Chung ; Yu, S. S ; Chen, Harrison ; Chang, C. Y ; Ho, Bang-Chein ; Lin, John C ; Lin, Burn J

Proc. SPIE, 2005, Vol.5753, p.171-180

Bellingham WA: SPIE

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10
Watermark defect formation and removal for immersion lithography
Watermark defect formation and removal for immersion lithography
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Watermark defect formation and removal for immersion lithography

Chang, Ching-Yu ; Yu, Da-Ching ; Lin, John C. H ; Lin, Burn J

Proceedings of SPIE, the International Society for Optical Engineering, 2006, Vol.6154, p.615417-615417-8

Bellingham, (Wash.): SPIE

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