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1
Biomedical nanostructures
Biomedical nanostructures
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Biomedical nanostructures

Kenneth E Gonsalves; Craig R Halberstadt; Cato T Laurencin; Lakshmi S Nair; Knovel (Firm)

Hoboken, N.J Wiley Chichester : John Wiley distributor c2008

Localização: IFSC - Inst. Física de São Carlos    (620.5 G639bi )(Acessar)

2
Nanotechnology molecularly designed materials
Nanotechnology molecularly designed materials
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Nanotechnology molecularly designed materials

Gan-Moog Chow 1957-; Kenneth E Gonsalves; American Chemical Society Division of Polymeric Materials: Science and Engineering; American Chemical Society Meeting Chicago, Ill.) 1995; National Meeting of the American Chemical Society (210th 1995 Chicago, Ill.)

Washington, DC American Chemical Society 1996

Localização: CQ - Conjunto das Químicas    (620.5 N186 ) e outros locais(Acessar)

3
Applications of fractals and chaos the shape of things
Applications of fractals and chaos the shape of things
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Applications of fractals and chaos the shape of things

A. J Crilly; Rae A Earnshaw 1944-; H Jones (Huw)

Berlin New York Springer-Verlag c1993

Localização: IF - Instituto de Física    (530.155352 C929a )(Acessar)

4
Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications
Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications
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Polyarylenesulfonium Salt as a Novel and Versatile Nonchemically Amplified Negative Tone Photoresist for High-Resolution Extreme Ultraviolet Lithography Applications

Reddy, Pulikanti Guruprasad ; Pal, Satyendra Prakash ; Kumar, Pawan ; Pradeep, Chullikkattil P ; Ghosh, Subrata ; Sharma, Satinder K ; Gonsalves, Kenneth E

ACS applied materials & interfaces, 2017-01, Vol.9 (1), p.17-21 [Periódico revisado por pares]

United States: American Chemical Society

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5
Recent advances in non-chemically amplified photoresists for next generation IC technology
Recent advances in non-chemically amplified photoresists for next generation IC technology
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Recent advances in non-chemically amplified photoresists for next generation IC technology

Ghosh, Subrata ; Pradeep, Chullikkattil P ; Sharma, Satinder K ; Reddy, Pulikanti Guruprasad ; Pal, Satyendra P ; Gonsalves, Kenneth E

RSC advances, 2016-01, Vol.6 (78), p.74462-74481 [Periódico revisado por pares]

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6
Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist
Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist
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Design, development, EUVL applications and nano mechanical properties of a new HfO2 based hybrid non-chemically amplified resist

Reddy, Pulikanti Guruprasad ; Mamidi, Narsimha ; Kumar, Pawan ; Sharma, Satinder K ; Ghosh, Subrata ; Gonsalves, Kenneth E ; Pradeep, Chullikkattil P

RSC advances, 2016-01, Vol.6 (71), p.67143-67149 [Periódico revisado por pares]

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7
Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate
Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate
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Enhanced mechanical properties of the high-resolution EUVL patterns of hybrid photoresists containing hexafluoroantimonate

Kumar, Pawan ; Reddy, Pulikanti Guruprasad ; Sharma, Satinder K. ; Ghosh, Subrata ; Pradeep, Chullikkattil P. ; Gonsalves, Kenneth E.

Microelectronic engineering, 2018-07, Vol.194, p.100-108 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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8
Biomedical Nanostructures
Biomedical Nanostructures
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Biomedical Nanostructures

Gonsalves, Kenneth ; Halberstadt, Craig ; Laurencin, Cato T ; Nair, Lakshmi

Hoboken, N.J: Wiley-Interscience 2007

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9
Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning
Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning
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Organoiodine Functionality Bearing Resists for Electron-Beam and Helium Ion Beam Lithography: Complex and Sub-16 nm Patterning

Yogesh, Midathala ; Moinuddin, Mohamad. G ; Chauhan, Manvendra ; Sharma, Satinder K ; Ghosh, Subrata ; Gonsalves, Kenneth E

ACS applied electronic materials, 2021-05, Vol.3 (5), p.1996-2004 [Periódico revisado por pares]

American Chemical Society

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10
Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications
Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications
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Ferrocene Bearing Non-ionic Poly-aryl Tosylates: Synthesis, Characterization and Electron Beam Lithography Applications

Reddy, Pulikanti Guruprasad ; Moinuddin, M. G. ; Joseph, Aneesh M. ; Nandi, Santu ; Ghosh, Subrata ; Pradeep, Chullikkattil P. ; Sharma, Satinder K. ; Gonsalves, Kenneth E.

Journal of Photopolymer Science and Technology, 2018/12/15, Vol.31(6), pp.669-678

Hiratsuka: The Society of Photopolymer Science and Technology(SPST)

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