Result Number | Material Type | Add to My Shelf Action | Record Details and Options |
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1 |
Material Type: Artigo
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Dynamic and structural stability of cubic vanadium nitrideMei, A. B. ; Hellman, O. ; Wireklint, N. ; Schlepütz, C. M. ; Sangiovanni, D. G. ; Alling, B. ; Rockett, A. ; Hultman, L. ; Petrov, I. ; Greene, J. E.Physical review. B, Condensed matter and materials physics, 2015-02, Vol.91 (5), p.054101, Article 054101 [Periódico revisado por pares]United States: American Physical SocietyTexto completo disponível |
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2 |
Material Type: Artigo
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Sputter deposition from a Ti2AlC target: Process characterization and conditions for growth of Ti2AlCFRODELIUS, J ; EKLUND, P ; BECKERS, M ; PERSSON, P. O. A ; HÖGBERG, H ; HULTMAN, LThin solid films, 2010, Vol.518 (6), p.1621-1626 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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3 |
Material Type: Artigo
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TA4AlC3 : Phase determination, polymorphism and deformationEKLUND, P ; PALMQUIST, J.-P ; HÖWING, J ; TRINH, D. H ; EL-RAGHY, T ; HÖGBERG, H ; HULTMAN, LActa materialia, 2007-08, Vol.55 (14), p.4723-4729 [Periódico revisado por pares]Oxford: Elsevier ScienceTexto completo disponível |
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4 |
Material Type: Artigo
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Phase transformation in κ- and γ-Al2O3 coatings on cutting tool insertsTrinh, D.H. ; Back, K. ; Pozina, G. ; Blomqvist, H. ; Selinder, T. ; Collin, M. ; Reineck, I. ; Hultman, L. ; Högberg, H.Surface & coatings technology, 2009-03, Vol.203 (12), p.1682-1688 [Periódico revisado por pares]Texto completo disponível |
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5 |
Material Type: Artigo
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Structural, electrical, and mechanical properties of nc-TiC∕a-SiC nanocomposite thin filmsEklund, P. ; Emmerlich, J. ; Högberg, H. ; Wilhelmsson, O. ; Isberg, P. ; Birch, J. ; Persson, P. O. Å. ; Jansson, U. ; Hultman, L.Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 2005-11, Vol.23 (6), p.2486-2495 [Periódico revisado por pares]Sem texto completo |
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6 |
Material Type: Artigo
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Homoepitaxial growth of Ti-Si-C MAX-phase thin films on bulk Ti3SiC2 substratesEKLUND, P ; MURUGAIAH, A ; EMMERLICH, J ; CZIGANY, Zs ; FRODELIUS, J ; BARSOUM, M. W ; HÖGBERG, H ; HULTMAN, LJournal of crystal growth, 2007-06, Vol.304 (1), p.264-269 [Periódico revisado por pares]Amsterdam: ElsevierTexto completo disponível |
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7 |
Material Type: Artigo
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Direct current magnetron sputtering deposition of nanocomposite alumina — zirconia thin filmsTrinh, D.H. ; Kubart, T. ; Nyberg, T. ; Ottosson, M. ; Hultman, L. ; Högberg, H.Thin solid films, 2008-10, Vol.516 (23), p.8352-8358 [Periódico revisado por pares]Amsterdam: Elsevier B.VTexto completo disponível |
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8 |
Material Type: Artigo
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Synthesis of the novel Zr3AlC2 MAX phaseLapauw, T. ; Halim, J. ; Lu, J. ; Cabioc'h, T. ; Hultman, L. ; Barsoum, M.W. ; Lambrinou, K. ; Vleugels, J.Journal of the European Ceramic Society, 2016-02, Vol.36 (3), p.943-947 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |
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9 |
Material Type: Artigo
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Microstructure and electrical properties of Ti–Si–C–Ag nanocomposite thin filmsEklund, P. ; Joelsson, T. ; Ljungcrantz, H. ; Wilhelmsson, O. ; Czigány, Zs ; Högberg, H. ; Hultman, L.Surface & coatings technology, 2007, Vol.201 (14), p.6465-6469 [Periódico revisado por pares]Lausanne: Elsevier B.VTexto completo disponível |
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10 |
Material Type: Artigo
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Single-crystal growth of NaCl-structure Al–Cr–N thin films on MgO(0 0 1) by magnetron sputter epitaxyWillmann, H. ; Beckers, M. ; Giuliani, F. ; Birch, J. ; Mayrhofer, P.H. ; Mitterer, C. ; Hultman, L.Scripta materialia, 2007-12, Vol.57 (12), p.1089-1092 [Periódico revisado por pares]Elsevier LtdTexto completo disponível |