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Thallium Bromide Deposited Using Spray Coating

Ferreira, E. S.; Mulato, M. Universidade De São Paulo

BRAZILIAN JOURNAL OF PHYSICS, NEW YORK, v. 42, n. 41367, supl. 1, Part 1, pp. 186-191, AUG, 2012

SPRINGER; NEW YORK 2012

Acesso online

  • Título:
    Thallium Bromide Deposited Using Spray Coating
  • Autor: Ferreira, E. S.; Mulato, M.
  • Universidade De São Paulo
  • Assuntos: Tlbr; Thallium Bromide; Film; Spray Coating; Semiconductor; Radiation Detector; Radiation Detector Applications; Gamma-Ray Spectroscopy; X-Ray; Tlbr Films; Thin-Films; Temperature; Crystals; Purification; Pyrolysis; Cdznte; Physics; Multidisciplinary
  • É parte de: BRAZILIAN JOURNAL OF PHYSICS, NEW YORK, v. 42, n. 41367, supl. 1, Part 1, pp. 186-191, AUG, 2012
  • Descrição: Spray coating was used to produce thallium bromide samples on glass substrates. The influence of several fabrication parameters on the final structural properties of the samples was investigated. Substrate position, substrate temperature, solution concentration, carrying gas, and solution flow were varied systematically, the physical deposition mechanism involved in each case being discussed. Total deposition time of about 3.5 h can lead to 62-mu m-thick films, comprising completely packed micrometer-sized crystalline grains. X-ray diffraction and scanning electron microscopy were used to characterize the samples. On the basis of the experimental data, the optimum fabrication conditions were identified. The technique offers an alternative method for fast, cheap fabrication of large-area devices for the detection of high-energy radiation, i.e., X-rays and gamma-rays, in medical imaging.
    CAPES
    FAPESP
    CNPq
  • DOI: 10.1007/s13538-012-0073-2
  • Títulos relacionados: BRAZILIAN JOURNAL OF PHYSICS
  • Editor: SPRINGER; NEW YORK
  • Data de publicação: 2012
  • Idioma: Inglês

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