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Resolving depth evolution of microstructure and hardness in sputtered CrN film

Zeilinger, A. ; Daniel, R. ; Schoberl, T. ; Stefenelli, M. ; Sartory, B. ; Keckes, J. ; Mitterer, C.

Thin Solid Films, April 30, 2015, Vol.581, p.75(5) [Periódico revisado por pares]

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  • Título:
    Resolving depth evolution of microstructure and hardness in sputtered CrN film
  • Autor: Zeilinger, A. ; Daniel, R. ; Schoberl, T. ; Stefenelli, M. ; Sartory, B. ; Keckes, J. ; Mitterer, C.
  • Assuntos: Hardness (Materials) – Analysis ; Hardness (Materials) – Mechanical Properties
  • É parte de: Thin Solid Films, April 30, 2015, Vol.581, p.75(5)
  • Descrição: To link to full-text access for this article, visit this link: http://dx.doi.org/10.1016/j.tsf.2014.10.106 Byline: A. Zeilinger, R. Daniel, T. Schoberl, M. Stefenelli, B. Sartory, J. Keckes, C. Mitterer Abstract: Hardness and elastic modulus of a sputtered nanocrystalline CrN thin film, prepared under varying ion bombardment conditions, were studied by nanoindentation using a depth-profiling technique and related to cross-sectional X-ray nanodiffraction data on the local microstructure. Changes in texture are shown to have almost no effect on the elastic modulus due to the isotropic response of the polycrystals. However, the locally varying growth conditions, which affect the crystal size and the number of defects in the film, determine the hardness values across the film thickness. Regions with highly distorted small crystals result in higher hardness in comparison with those with well-developed coarsened grains. This study confirms the notion of the existence of growth-related hardness gradients in single-phase nanocrystalline thin films.
  • Idioma: Inglês

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