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Femtosecond laser fabrication of high reflectivity micromirrors

Brodoceanu, D. ; Cole, G. D. ; Kiesel, N. ; Aspelmeyer, M. ; Bäuerle, D.

Applied Physics Letters, 26 July 2010, Vol.97(4) [Periódico revisado por pares]

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  • Título:
    Femtosecond laser fabrication of high reflectivity micromirrors
  • Autor: Brodoceanu, D. ; Cole, G. D. ; Kiesel, N. ; Aspelmeyer, M. ; Bäuerle, D.
  • Assuntos: Lasers, Optics, And Optoelectronics
  • É parte de: Applied Physics Letters, 26 July 2010, Vol.97(4)
  • Descrição: High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry–Pérot interferometry; a finesse in excess of 8900 ± 700 , corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.
  • Idioma: Inglês

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