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Magnetization and Magnetic Microscopy Studies in Fe Thin Films

Jeyaramane, Arout Chelvane ; Prasad, Ch. D. V.

Journal of electronic materials, 2021-03, Vol.50 (3), p.1119-1131 [Periódico revisado por pares]

New York: Springer US

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Título:
Magnetization and Magnetic Microscopy Studies in Fe Thin Films
Autor: Jeyaramane, Arout Chelvane ; Prasad, Ch. D. V.
Assuntos: Anisotropy ; Characterization and Evaluation of Materials ; Chemistry and Materials Science ; Electronics and Microelectronics ; Instrumentation ; Magnetic anisotropy ; Magnetic domains ; Magnetism ; Magnetization reversal ; Materials Science ; Optical and Electronic Materials ; Original Research Article ; Room temperature ; Silicon substrates ; Solid State Physics ; Thickness ; Thin films
É parte de: Journal of electronic materials, 2021-03, Vol.50 (3), p.1119-1131
Descrição: This paper reports the magnetic domain imaging and magnetization studies carried out on Fe thin films grown with different thicknesses, namely, 5, 15 nm, 30 nm, 50 nm, 75 nm and 100 nm. Films were grown on Si at two different substrate temperatures, namely, room temperature and 550°C. Based on the detailed studies carried out, it was observed that Fe layer thickness and substrate temperature are important control parameters in tuning the magnetic anisotropy along the in-plane (IP) or out-of-plane (OOP) directions. A crossover from surface to volume anisotropy has been demonstrated with change in film thicknesses. Domain imaging studies carried out on Fe films grown at different substrate temperatures and with different thicknesses aided us to understand the magnetic anisotropy and magnetization reversal mechanisms.
Editor: New York: Springer US
Idioma: Inglês

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Magnetization and Magnetic Microscopy Studies in Fe Thin Films

Jeyaramane, Arout Chelvane ; Prasad, Ch. D. V.

New York: Springer US

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