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Synthesis and characterization of Ni-doped TiN thin films deposited by jet electrodeposition

Xia, F.F. ; Jia, W.C. ; Ma, C.Y. ; Yang, R. ; Wang, Y. ; Potts, M.

Applied surface science, 2018-03, Vol.434, p.228-233 [Periódico revisado por pares]

Elsevier B.V

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  • Título:
    Synthesis and characterization of Ni-doped TiN thin films deposited by jet electrodeposition
  • Autor: Xia, F.F. ; Jia, W.C. ; Ma, C.Y. ; Yang, R. ; Wang, Y. ; Potts, M.
  • Assuntos: Corrosion property ; Jet electrodeposition ; Mechanical deformation response ; Microstructure ; Ni-doped TiN thin film
  • É parte de: Applied surface science, 2018-03, Vol.434, p.228-233
  • Descrição: •Ni-doped TiN thin films were successfully deposited by jet electrodeposition.•The average size of nickel grains and TiN nanoparticles in the Ni-doped TiN thin film deposited at 5g/L were 44.5 and 23.2nm, respectively.•The nanohardness of the film deposited at 5g/L demonstrated the highest nanohardness (∼34.5GPa). The Ni-doped TiN thin films were successfully prepared by jet electrodeposition in this paper. The microstructure, corrosion properties and mechanical deformation response of the films were studied by means of high resolution transmission electron microscopy (HRTEM), X-ray diffraction (XRD), electrochemical workstation and triboindenter (TI) equipment. The results indicated that the Ni-doped TiN thin film fabricated at the TiN addition amount of 5g/L, had an uniform and fine microstructure. The average particle sizes of nickel grains and TiN nanoparticles were 44.5 and 23.2nm, respectively. The Ni-doped TiN thin film obtained at 5g/L had the minimum corrosion potential and corrosion current values of −0.398V and 1.08×10−3mA/cm2, respectively. When the applied load was 1500μN, the depths of the Ni-doped TiN thin films produced at 3g/L, 5g/L and 8g/L were approximately 35, 28 and 30μm, respectively. The nanohardness of the Ni-doped TiN thin film deposited at 5g/L demonstrated the highest nanohardness (∼34.5GPa), whereas the film prepared at 3g/L had the lowest nanohardness (∼25.8GPa). Subsequently to 4 sliding scans, the amounts of plastic deformation and wear damage in the Ni-doped TiN thin film prefabricated at 5g/L were the lowest compared to the other films.
  • Editor: Elsevier B.V
  • Idioma: Inglês
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  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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