Hydrogenated amorphous silicon films deposited by electron cyclotron resonance chemical vapor deposition at room temperature with different radio frequency chuck powers

Alvarez, Hugo da S. ; Silva, Audrey R. ; Cioldin, Frederico H. ; Espindola, Luana C.J. ; Diniz, José A.

Thin solid films, 2019-11, Vol.690, p.137534, Article 137534 [Periódico revisado por pares]

Elsevier B.V

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