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Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions

Stephen M Rossnagel; J. J Cuomo; William D Westwood 1937- (William Dickson)

Park Ridge, N.J., U.S.A. Noyes Publications c1990

Localização: EPELM - Esc. Politécnica-Bib Eng Elet., Mec. e Naval    (537.52 H191 ) e outros locais(Acessar)

  • Título:
    Handbook of plasma processing technology fundamentals, etching, deposition, and surface interactions
  • Autor: Stephen M Rossnagel; J. J Cuomo; William D Westwood 1937- (William Dickson)
  • Assuntos: Plasma engineering; Semiconductors -- Etching; Plasma etching; PLASMA (MICROELETRÔNICA); SEMICONDUTORES
  • Notas: Includes bibliographical references
  • Descrição: Techniques for IC processing / David B. Fraser and William D. Westwood -- Introduction to plasma concepts and discharge configurations / Joseph L. Cecchi -- Fundamentals of sputtering and reflection / David N. Ruzic -- Bombardment-induced compositional change with alloys, oxides, oxysalts, and halides / Roger Kelly -- RF diode sputter etching and deposition / Joseph S. Logan -- Magnetron plasma deposition processes / Stephen M. Rossnagel -- Broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Reactive ion etching / Gottlieb S. Oehrlein -- Reactive sputter deposition / William D. Westwood -- Plasma enhanced chemical vapor deposition of thin films for microelectronics / Rafael Reif -- Electron cyclotron resonance microwave discharges for etching and thin film deposition / Jes Asmussen Hollow cathode etching and deposition / Chris M. Horwitz -- Ion platting / Donald M. Mattox -- Ionized cluster beam (ICB) deposition techniques / Isao Yamada -- The activated reactive evaporation (ARE) process / Chandra V. Deshpandey and Rointan F. Bunshah -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg and Claes Nender -- Formation of thin films by remote plasma enhanced chemical vapor deposition (Remote PECVD) / Gerold Lucovsky, David V. Tsu and Robert J. Markunas -- Selective bias sputter deposition / Soren Berg
    and Claes Nender -- Vacuum arc-based processing / David Sanders -- Ion-surface interactions : general understandings / Russell Messier, Joseph E. Yehoda and Lawrence J. Pilione -- Ion assisted deposition / James J. McNally Microstructural control of plasma-sputtered refractory coatings / David M. Hoffman and Robert C. McCune
  • Títulos relacionados: Série:Materials science and process technology series
  • Editor: Park Ridge, N.J., U.S.A. Noyes Publications
  • Data de criação/publicação: c1990
  • Formato: xxiii, 523 p. ill. 25 cm.
  • Idioma: Inglês
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  • Realização: ABCD-USP USP   Logos de Redes Sociais: Freepik

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