Effects of focused ion beam reticle repair on optical lithography at i -line and deep ultraviolet wavelengths
Prewett, P. D. ; Martin, B. ; Eastwood, A. W. ; Watson, J. G.
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 1993-11, Vol.11 (6), p.2427-2431Sem texto completo
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