Resistive switching mechanisms relating to oxygen vacancies migration in both interfaces in Ti/HfOx/Pt memory devices
Lin, Y. S. ; Zeng, F. ; Tang, S. G. ; Liu, H. Y. ; Chen, C. ; Gao, S. ; Wang, Y. G. ; Pan, F.
Journal of applied physics, 2013-02, Vol.113 (6) [Periódico revisado por pares]Texto completo disponível