120 MeV Ag ion irradiation induced intermixing, grain fragmentation in HfO 2 /GaO x thin films and consequent effects on the electrical properties of HfO 2 /GaO x /Si-based MOS capacitors
Vinod Kumar, K. ; Arun, N. ; Mangababu, A. ; Ojha, Sunil ; Nageswara Rao, S. V. S. ; Pathak, A. P.
Radiation effects and defects in solids, 2020-01, Vol.175 (1-2), p.150-159 [Periódico revisado por pares]Texto completo disponível