Kinetically tailored properties of electron-beam excited XeF(C → A) and XeF(B → X) laser media using an Ar-Kr buffer mixture
Nighan, W. ; Sauerbrey, R. ; Yunping Zhu ; Tittel, F. ; Wilson, W.
IEEE J. Quant. Electron.; (United States), 1987-02, Vol.23 (2), p.253-261 [Periódico revisado por pares]New York, NY: IEEE
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