0.5 keV Xe super(+ ion beam nano smoothing of ULE registered substrate after processing with 3.0-10.0 keV Xe) super(+) ion beam

Morijiri, K ; Endo, H ; Morikaawa, K ; Pahlovy, SA ; Miyamoto, I

Microelectronic engineering, 2011-08, Vol.88 (8), p.2694-2696 [Periódico revisado por pares]

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