Structural analysis of silicon oxynitride films deposited by PECVD
Denise Criado Marco Isaías Alayo Chávez 1971-; Inés Pereyra 1947-; Márcia Carvalho de Abreu Fantini
Materials Science and Engineering B v. 112, n. 2-3, p. 123-127, 2004
São Paulo 2004
Acesso online