Low temperature carbon co-implantation in silicon: Defects suppression and diffusion modeling

Dumas, P. ; Julliard, P.-L. ; Borrel, J. ; Duguay, S. ; Hilario, F. ; Deprat, F. ; Lu, V. ; Zhao, W. ; Zou, W ; Arevalo, E. ; Blavette, D.

Journal of applied physics, 2021-05, Vol.129 (19) [Periódico revisado por pares]

American Institute of Physics

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