Investigation of character and spatial distribution of threading edge dislocations in 4H-SiC epilayers by high-resolution topography

Kamata, I. ; Nagano, M. ; Tsuchida, H. ; Chen, Yi ; Dudley, M.

Journal of crystal growth, 2009-02, Vol.311 (5), p.1416-1422 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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