Dry Etch Challenges in Gate All Around Devices for sub 32 nm Applications
Barnola, Sebastien ; Vizioz, Christian ; Vulliet, Nathalie ; Dupré, Cécilia ; Ernst, Thomas ; Gautier, Pauline ; Arvet, Christian ; Guillaumot, Bernard ; Bernard, Emilie ; Pauliac-Vaujeour, S. ; Comboroure, Corine ; Hartmann, Jean-Michel ; Borel, Stephan ; Chevolleau, Thierry ; Maffini-Alvaro, V ; Becu, S
ECS transactions, 2009, Vol.16 (10), p.923-934Texto completo disponível