Charge trapping and interface states in hydrogen annealed HfO2-Si structures

GOMENIUK, Y. V ; NAZAROV, A. N ; VOVK, Ya. N ; LYSENKO, V. S ; YI LU ; BUIU, O ; HALL, S ; POTTER, R. J ; CHALKER, P

Microelectronics and reliability, 2007-04, Vol.47 (4-5), p.714-717 [Periódico revisado por pares]

Oxford: Elsevier

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