Highly oriented Bi-based thin films with zero resistance at 106 K

Kula, W. ; Sobolewski, R. ; Gorecka, J. ; Lewandowski, S.J.

IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), 1991-03, Vol.27 (2), p.1581-1584

New York, NY: IEEE

Texto completo disponível