A method to determine the pressure and densities of gas stored in blisters: Application to H and He sequential ion implantation in silicon

Daghbouj, N. ; Cherkashin, N. ; Claverie, A.

Microelectronic engineering, 2018-04, Vol.190, p.54-56 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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