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Femtosecond laser fabrication of high reflectivity micromirrors

Brodoceanu, D ; Cole, G D ; Kiesel, N ; Aspelmeyer, M ; Bäuerle, D

Applied physics letters, 2010-07, Vol.97 (4), p.041104-041104-3 [Periódico revisado por pares]

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Título:
Femtosecond laser fabrication of high reflectivity micromirrors
Autor: Brodoceanu, D ; Cole, G D ; Kiesel, N ; Aspelmeyer, M ; Bäuerle, D
É parte de: Applied physics letters, 2010-07, Vol.97 (4), p.041104-041104-3
Descrição: High-quality freestanding micromirrors consisting of 40 dielectric layers on silicon have been fabricated by ultrashort-pulse laser ablation in combination with laser-assisted wet chemical etching. Backside material removal enables direct access to both faces of the dielectric coating. The amplitude reflectance of the micromirrors has been determined by Fabry-Pérot interferometry; a finesse in excess of 8900 ± 700 , corresponding to a reflectivity exceeding 99.95%, has been found. The mechanical quality factor, Q, of the microresonators, measured at 20 K, is determined to be between 5000 and 6000.
Editor: American Institute of Physics
Idioma: Inglês

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