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Ferroelectric thin films for integrated passive components

Klee, M. ; Mackens, U. ; Kiewitt, R. ; Greuel, G. ; Metzmacher, C.

Philips journal of research, 1998, Vol.51 (3), p.363-387

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Título:
Ferroelectric thin films for integrated passive components
Autor: Klee, M. ; Mackens, U. ; Kiewitt, R. ; Greuel, G. ; Metzmacher, C.
É parte de: Philips journal of research, 1998, Vol.51 (3), p.363-387
Descrição: Miniaturisation and integration of passive components play an important role in today's components market. It can be achieved by applying thin-film technologies for capacitors, resistors and inductors; high component densities have been realised with ‘Passive Only Networks’. The dielectric materials used for integrated thin-film capacitors ranging from Si 3N 4, Ta 2O 5, TiO 2 to earth alkaline as well as lead perovskite layers are reviewed. The capacitor performances including temperature stability, insulation resistance, breakdown fields and endurance are discussed as a function of material composition.
Editor: Elsevier Science
Idioma: Inglês

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