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Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

Manfrinato, Vitor R ; Zhang, Lihua ; Su, Dong ; Duan, Huigao ; Hobbs, Richard G ; Stach, Eric A ; Berggren, Karl K

Nano letters, 2013-04, Vol.13 (4), p.1555-1558 [Periódico revisado por pares]

Washington, DC: American Chemical Society

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Título:
Resolution Limits of Electron-Beam Lithography toward the Atomic Scale
Autor: Manfrinato, Vitor R ; Zhang, Lihua ; Su, Dong ; Duan, Huigao ; Hobbs, Richard G ; Stach, Eric A ; Berggren, Karl K
Assuntos: Aberration ; Cross-disciplinary physics: materials science; rheology ; Electron beam lithography ; Electronics ; Electrons ; Energy measurement ; Energy use ; Exact sciences and technology ; functional nanomaterials ; high voltage electron beam lithography ; Hydrogen - chemistry ; Materials science ; Methods of nanofabrication ; Microscopy, Electron, Scanning Transmission ; Nanolithography ; NANOSCIENCE AND NANOTECHNOLOGY ; Nanostructure ; Organosilicon Compounds - chemistry ; Physics ; Resists ; Scanning electron microscopy ; Spectroscopy ; Spectroscopy, Electron Energy-Loss ; STEM lithography
É parte de: Nano letters, 2013-04, Vol.13 (4), p.1555-1558
Notas: ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
USDOE Office of Science (SC), Basic Energy Sciences (BES) (SC-22)
BNL-101189-2013-JA
DE-AC02-98CH10886
Descrição: We investigated electron-beam lithography with an aberration-corrected scanning transmission electron microscope. We achieved 2 nm isolated feature size and 5 nm half-pitch in hydrogen silsesquioxane resist. We also analyzed the resolution limits of this technique by measuring the point-spread function at 200 keV. Furthermore, we measured the energy loss in the resist using electron-energy-loss spectroscopy.
Editor: Washington, DC: American Chemical Society
Idioma: Inglês

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Resolution Limits of Electron-Beam Lithography toward the Atomic Scale

Manfrinato, Vitor R ; Zhang, Lihua ; Su, Dong ; Duan, Huigao ; Hobbs, Richard G ; Stach, Eric A ; Berggren, Karl K

Washington, DC: American Chemical Society

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