Complex interface and growth analysis of single crystalline epi-Si(111)/Y2O3/ Pr2O3/Si(111) heterostructures: Strain engineering by oxide buffer control

Wilke, A. ; Yang, J.-M. ; Kim, J. W. ; Seifarth, O. ; Dietrich, B. ; Giussani, A. ; Zaumseil, P. ; Storck, P. ; Schroeder, T.

Surface and interface analysis, 2011-04, Vol.43 (4), p.827-835 [Periódico revisado por pares]

Chichester, UK: John Wiley & Sons, Ltd

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