The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films

Beckers, M ; Höglund, C ; Baehtz, C ; Martins, R M. S ; Persson, P O. Å ; Hultman, L ; Möller, W

Journal of applied physics, 2009-09, Vol.106 (6), p.064915-064915-7 [Periódico revisado por pares]

United States: American Institute of Physics

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