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Ultrashort electron emission improved by alkali ions implantation into metallic photocathodes

Afif, M. ; Girardeau-Montaut, J.P. ; Tomas, C. ; Girardeau-Montaut, C. ; Warda, K. ; Delafond, J. ; Fayoux, C.

Applied surface science, 1997-02, Vol.111, p.241-245 [Periódico revisado por pares]

Amsterdam: Elsevier B.V

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Título:
Ultrashort electron emission improved by alkali ions implantation into metallic photocathodes
Autor: Afif, M. ; Girardeau-Montaut, J.P. ; Tomas, C. ; Girardeau-Montaut, C. ; Warda, K. ; Delafond, J. ; Fayoux, C.
Assuntos: Applied sciences ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Electron and ion emission by liquids and solids; impact phenomena ; Electronics ; Exact sciences and technology ; Ion potassium implantation into tungsten ; Photoelectric sensitivity ; Photoemission and photoelectron spectra ; Physics ; Picosecond UV laser ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Vacuum microelectronics
É parte de: Applied surface science, 1997-02, Vol.111, p.241-245
Descrição: The photocathodes we are studying combine the high laser damage threshold and the long lifetime of metallic photocathodes with the high photoelectric sensitivity and the low work function of semiconductor ones. They consisted of alkali ion implantation into the metal surface, in particularly tungsten, implanted by potassium ions in 40 nm thickness surface layer. The photoelectric performances at p-polarization and at various angles of incidence using a picosecond Nd YAG laser with τ = 16 ps and λ = 213 nm. A significant improvement of the photoelectric sensitivity of K +-implanted W photocathodes have been demonstrated, as well as a good stability of the performances during more than 100 h irradiation.
Editor: Amsterdam: Elsevier B.V
Idioma: Inglês

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Ultrashort electron emission improved by alkali ions implantation into metallic photocathodes

Afif, M. ; Girardeau-Montaut, J.P. ; Tomas, C. ; Girardeau-Montaut, C. ; Warda, K. ; Delafond, J. ; Fayoux, C.

Amsterdam: Elsevier B.V

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