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Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect

Whitlow, Harry J ; Ng, May Ling ; Auželyté, Vaida ; Maximov, Ivan ; Montelius, Lars ; Kan, Jeroen A van ; Bettiol, Andrew A ; Watt, Frank

Nanotechnology, 2004-01, Vol.15 (1), p.223-226 [Periódico revisado por pares]

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Título:
Lithography of high spatial density biosensor structures with sub-100 nm spacing by MeV proton beam writing with minimal proximity effect
Autor: Whitlow, Harry J ; Ng, May Ling ; Auželyté, Vaida ; Maximov, Ivan ; Montelius, Lars ; Kan, Jeroen A van ; Bettiol, Andrew A ; Watt, Frank
Assuntos: Engineering and Technology ; Nano Technology ; Nanoteknik ; Teknik
É parte de: Nanotechnology, 2004-01, Vol.15 (1), p.223-226
Notas: ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
Descrição: Metal electrode structures for biosensors with a high spatial density and nm gaps have been produced using focused megaelectronvolt (MeV) proton beam writing of poly-(methyl methacrylate) positive resist combined with metal lift-off. The minimal proximity exposure and straight proton trajectories in ( nm) resist layers for focused MeV proton beam writing are strongly indicative that ultimate electrode gap widths approaching a few nanometres are achievable.
Editor: IOP Publishing
Idioma: Inglês;Romeno

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